Our services includes Fabrication Services, Analytical Services, Talent Development and Multi Project Wafer.
MIMOS Wafer Fab, second facility, Fab 2, operates at medium volume capacity of 200mm wafers. Our operation is backed by state-of-the-art and robust technologies from IMS Germany and NTT Japan.
The 200mm wafer fabrication plant is fully-equipped with world class technology as well as machinery, to cater the various industrial and research requirements. We are able to provide a wide range of service including Design Support, Customised Processes, Multi-Project Wafer (MPW) programmes and Product Development & Fabrication in CMOS, HVMOS, Digital, Analog and Microelectromechanical systems (MEMS) technology platforms.
We have successfully developed our-house technology of HVMOS, 0.35um, 0.5um and above with industrial standard processes.
Fab 2 : 1200 sq meter with 400 sq meter of Class 1 Clean room